Infrared Sub-nanosecond Laser NPFL-80IR-1.01
Brief Description
Categories
Femtosecond/Infrared Sub-nanosecond Laser
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| No. | Parameter | Specification | Remark |
| 1 | Running mode | Pulse | |
| 2 | Average power (W) | 80 | |
| 3 | Central wavelength (nm) | 1064 | |
| 4 | Line width (nm) | ＜30 | 3dB line width |
| 5 | Repetition frequency (kHz) | 100-2000 | Adjustable |
| 6 | Pulse width (ns) | 0.1-0.2ns | Customizable |
| 7 | Maximum single pulse energy (mJ) | 0.8 | |
| 8 | Power regulating range(%) | 0-100 | |
| 9 | Response time (us) | ＜100 | |
| 10 | Beam quality (M2) | ≤1.5 | |
| 11 | Power stability (%) | ≤3% | 24h |
| 12 | Spot size (mm) | 3.0±0.2 | 1/e2 |
| 13 | Spot roundness (%) | ＞90 | Typ.92% |
| 14 | Beam offset (mm) | ＜1.0 | |
| 15 | Beam divergence angle (mrad) | ＜0.5 |
Product features
1) Sub-nanosecond pulse
2) High peak energy and peak power
3) Adjustable repetition frequency
4) Near-diffraction-limited beam quality
5) Compact structure and small size
Applications
1) Cutting, drilling, scribing (glass, silicon, ceramic)
2) Thin-film pattern (metal, thin film)
3) Marking (glass, silicon, ceramic, metal, plastic)
Sample
