Infrared Sub-nanosecond Laser NPFL-80IR-1.01
Infrared Sub-nanosecond Laser NPFL-80IR-1.01

Infrared Sub-nanosecond Laser NPFL-80IR-1.01

Brief Description
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No. Parameter Specification Remark
1 Running mode Pulse  
2 Average power (W) 80  
3 Central wavelength (nm) 1064  
4 Line width (nm) 30 3dB line width
5 Repetition frequency (kHz) 100-2000 Adjustable
6 Pulse width (ns) 0.1-0.2ns Customizable
7 Maximum single pulse energy (mJ) 0.8  
8 Power regulating range(%) 0-100  
9 Response time (us) 100  
10 Beam quality (M2) ≤1.5  
11 Power stability (%) ≤3% 24h
12 Spot size (mm) 3.0±0.2 1/e2
13 Spot roundness (%) 90 Typ.92%
14 Beam offset (mm) 1.0  
15 Beam divergence angle (mrad) 0.5  

Product features
1)    Sub-nanosecond pulse
2)    High peak energy and peak power
3)    Adjustable repetition frequency
4)    Near-diffraction-limited beam quality
5)    Compact structure and small size

Applications
1)    Cutting, drilling, scribing (glass, silicon, ceramic)
2)    Thin-film pattern (metal, thin film)  
3)    Marking (glass, silicon, ceramic, metal, plastic)
Sample
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