

1. Adjustable repetition frequency
2. Modular design
3. TEM00 mode output
4. High average power, up to 30W
Featuring ultra-small heat-affected zone from exclusive cold processing technology, this machine achieves ultra-fine machining and microstructure fabrication on non-metallic brittle materials in high-end manufacturing. It is widely used in 3C sector and key mobile phone production processes. Its total shipments surpass 15,000 units, ranking top in market share of equivalent lasers.
Application Scope:
1. Marking, depaneling, cutting and drilling of PCB & FPC
2. Micro-hole and blind-hole machining of silicon wafers
3. Solar cell processing
4. Silicon wafer scribing
5. Ceramic scribing, cutting and drilling
6. Ink and PVD coating removal
7. Material surface marking

Machine Model | HL-NS-355-5/10/15 | HL-NS-355-20 |
Laser Characteristics | ||
Wavelength | 355nm | |
Power | 5W/10W/15W | 20W |
Repetition Frequency | 10-200 kHz | 60-400khz |
Pulse Width | 10-100ns | 20-100ns |
Pulse Stability | <3%rms,1σ | <3%rms,1σ |
Beam Characteristics | ||
Spatial Mode | TEM00 | |
M2 | <1.3 | |
Degree Of Polarization | 100:1 Horizontal | |
Spot Diameter | 1.1 mm ±0.1mm | 1.4mm ±0.2mm |
Full Divergence Angle | <2 mrad | |
Spot Symmetry | >90% | |
Beam Directivity | <± 25 µrad/°C | |
Operating Conditions | ||
Supply Voltage | 100-240V,50 -60Hz | |
Warm-Up Time | Standby to ready:<10 mins; Cold start to ready:<30 mins | |
Temperature Range | Operating: 18~35°C; Non-operating: 0~50°C | |
Humidity | 10–90%, non-condensing | |
Cooling Method | Water cooling; Chiller accuracy: ±0.1°C; Minimum flow rate: 6L/min | |
Total Power Consumption | <1000 W | |
Physical Characteristics | ||
Laser Head Dimensions (L × W × H) | 500mm×230.5mm×132mm | |
Laser Head Weight | 18kg | |
Controller Dimensions (L × W × H) | 477 mm× 440mm × 177mm | |
Controller Weight | 21kg | |