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High Power Femtosecond Laser

HPF-50-IR

Machine Features

1.Femtosecond pulse

2.High pulse energy and peak power

3.Near-diffraction-limited beam quality

4.High stability and reliability

Applications

This laser adopts advanced chirped pulse amplification technology to deliver near-diffraction-limited femtosecond laser output. It has been mass applied in semiconductor and consumer electronics industries with superior process performance and high stability.

Application Scope:

Cutting, drilling and scribing (glass, silicon, ceramics, flexible printed circuit boards)

Thin film patterning (metals, thin films)

Marking (glass, silicon, ceramics, metals, plastics)

Technical Data Sheet

Parameters	Parameter values	Remarks
Operation Mode	Pulse
Average Power（W）	50w@600kHz	20w@100kHz
Central Wavelength（nm）	1030
Linewidth（nm）	＜3	3dB Linewidth
Repetition Frequency（kHz）	50-2000	Adjustable
Pulse Width（fs）	600-30000fs	Customizable
Maximum Single Pulse Energy（uJ）	200
Power Adjustment Range（%）	0-100
Response Time（us）	＜100
Beam Quality（M2）	≤1.3
Power Stability（%）	≤2%	24h
Spot Size（mm）	2.5±0.3	1/e2
Spot Ellipticity（%）	＞90	Typ.93%
Beam Offset（mm）	＜1.0
Beam Divergence Angle（mrad）	＜0.5

Sales Hotline

+86-400-666-4000