Products Laser Generator Femtosecond & Sub-Nanosecond Lasers

High Power Femtosecond Laser HPF-50-IR

Machine Features

1.Femtosecond pulse

2.High pulse energy and peak power

3.Near-diffraction-limited beam quality

4.High stability and reliability


Applications

This laser adopts advanced chirped pulse amplification technology to deliver near-diffraction-limited femtosecond laser output. It has been mass applied in semiconductor and consumer electronics industries with superior process performance and high stability.

Application Scope:

Cutting, drilling and scribing (glass, silicon, ceramics, flexible printed circuit boards)

Thin film patterning (metals, thin films)

Marking (glass, silicon, ceramics, metals, plastics)


Technical Data Sheet

Parameters

Parameter values

Remarks

Operation Mode

Pulse


Average Power（W）

50w@600kHz

20w@100kHz

Central Wavelength（nm）

1030


Linewidth（nm）

＜3

3dB Linewidth

Repetition Frequency（kHz）

50-2000

Adjustable

Pulse Width（fs）

600-30000fs

Customizable

Maximum Single Pulse Energy（uJ）

200


Power Adjustment Range（%）

0-100


Response Time（us）

＜100


Beam Quality（M2）

≤1.3


Power Stability（%）

≤2%

24h

Spot Size（mm）

2.5±0.3

1/e2

Spot Ellipticity（%）

＞90

Typ.93%

Beam Offset（mm）

＜1.0


Beam Divergence Angle（mrad）

＜0.5



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